SiAlON Growth and Characterization

SiAlON THIN FILM GROWTH & CHARACTERIZATION

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This work focused on the development of silicon-aluminum oxynitride (SiAlON) thin films to protect the surface of surface acoustic wave devices from abrasion, corrosion, and oxidation. This particular type of thin solid film was chosen because it has attractive mechanical and chemical properties and can withstand very high temperatures which was a requirement for the targeted application. The amorphous films were grown by RF magnetron sputter of silicon and aluminum targets in an argon-nitrogen-oxygen atmosphere. To achieve different film stoichiometries, the power of the magnetrons, as well as the relative concentration of the gases in the chamber, were systematically varied. Films with different growth parameters were characterized in terms of their hardness, chemical properties, and structural properties. The images below show a few of the techniques used to characterize the films.

For more information about the growth and characterization of SiAlON films, please see these publications:

Click on any image to enlarge:

The two magnetrons in the deposition chamber with silicon and aluminum targets. The purple plasma glow comes from the argon in the chamber's atmosphere.

An X-ray photoelectron spectroscopy (XPS) spectrum used to determine the stoichiometry of the SiAlON films. The intensities of the photoelectron peaks from the different elements allows us to quantify the relative abundance of each element in the film.

An X-ray reflectivity scan used to determine the thickness of the films. The spacing of the fringes in the spectrum allows us to determine film thickness to within a few angrstoms.